Production of silicon from magnesium silicide

Kinetic methods and thermogravimetry were used to study the oxidation process of magnesium silicide in air in the temperature range 300–1000°C. The reaction products were identified by X-ray phase analysis. It was found that the reaction occurs in the temperature range 510–710°C to give silicon and magnesium oxide. With the temperature increasing further, silicon is oxidized to silicon dioxide.