| 铜激光倍频光亚微米投影光刻系统的设计和实验研究 |
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| 引用本文： | 黄惠杰 路敦武. 铜激光倍频光亚微米投影光刻系统的设计和实验研究[J]. 光学学报, 1997, 17(1): 17-121 |
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| 作者姓名： | 黄惠杰 路敦武 |
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| 作者单位： | 中国科学院上海光学精密机械研究所 |
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| 摘 要： | 为了研究波长在２５５．３ｎｍ的铜蒸气激光倍频在亚微米光刻中的可行性，设计了带宽为１ｎｍ的１：１折反射式投影光刻物镜和一个带散射板的光管式均匀照相系统，获得了０．６μｍ的光刻分辨率。此结果表明，铜激光倍频光可作为亚微米光刻的照明光源。
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| 关 键 词： | 远紫外光刻 亚微米 光刻物镜 铜激光倍频光 |
| 收稿时间： | 1996-01-24 |
Submicron Projection Lithography with Second Harmonic Light of Copper Vapor Laser |
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| Huang Huijie Lu Dunwu Du Longlong Ren Hong Liang Peihui. Submicron Projection Lithography with Second Harmonic Light of Copper Vapor Laser[J]. Acta Optica Sinica, 1997, 17(1): 17-121 |
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| Authors: | Huang Huijie Lu Dunwu Du Longlong Ren Hong Liang Peihui |
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| Abstract: | In order to study the feasibility of submicron lithography using second harmonic light of a copper vapor laser(CVL), a 1∶1 catadioptric projection lens, and an illumination system which consists of a rotating diffuser and a ligth pipe, are designed and constructed. A resolution of 0.6 μm line/space patterns is produced in AZ1350 resist. The result shows that the second harmonic light of CVL can be used as an illumination source in submicron lithography. |
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| Keywords: | DUV lithography submicron lithography lithography lens second harmonic light of CVL uniform illumination system. |
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