The role of the configurational force balance in the nonequilibrium epitaxy of films |
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Authors: | Eliot Fried Morton E Gurtin |
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Institution: | a Department of Theoretical and Applied Mechanics, University of Illinois at Urbana-Champaign, 216 Talbot Lab, Urbana, IL 61801-2935, USA b Department of Mathematical Sciences, Carnegie Mellon University, Pittsburgh, PA 15213-3890, USA |
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Abstract: | We discuss the epitaxial growth of an elastic film, allowing for stress and diffusion within the film surface as well as nonequilibrium interactions between the film and the vapor. Our approach, which relies on recent ideas concerning configurational forces, is based on: (i) standard (Newtonian) balance laws for forces and moments together with an independent balance law for configurational forces; (ii) atomic balances, one for each species of mobile atoms; (iii) a mechanical version of the second law that accounts for temporal changes in free energy, energy flows due to atomic transport, and power expended by both standard and configurational forces; (iv) thermodynamically consistent constitutive relations for the film surface and for the interaction between the surface and the vapor environment. The normal component of the configurational force balance at the surface represents a generalization, to a dynamical context involving dissipation, of a condition that would arise in equilibrium by considering variations of the total free energy with respect to the configuration of the film surface. Our final results consist of partial differential equations that govern the evolution of the film surface. |
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Keywords: | A Chemo-mechanical process A Surface diffusion A Adatom interactions B Thin films B Surface stress B Chemical potential |
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