The effect of etching solution composition on the response of an electrochemically etched CR-39 detector

Etching solutions of different compositions were applied at room temperature (22°C) for electrochemical etching. The background developed during electrochemical etching in a CR-39 track detector was investigated. Detectors irradiated with alphas of 5.49 MeV were measured also. It was found that the PEW solutions (potassiumhydroxid, ethylalcohol, water) showed good sensitivity. One of them (PEW_20/40 was applied for neutrons from a ²⁵²Cf source. The achieved registration sensitivity was about 10⁻⁵ spot/n after 3 hours of etching time.