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用于氮化镓发光二极管窗口层的铝掺杂氧化锌的生长
引用本文:吴嘉城,林伯融,陈采宁,游亭恩,武东星. 用于氮化镓发光二极管窗口层的铝掺杂氧化锌的生长[J]. 发光学报, 2008, 29(3)
作者姓名:吴嘉城  林伯融  陈采宁  游亭恩  武东星
作者单位:台湾中兴大学,材料科学及工程学系,台湾,台中;台湾中兴大学,材料科学及工程学系,台湾,台中;台湾中兴大学,材料科学及工程学系,台湾,台中;台湾中兴大学,材料科学及工程学系,台湾,台中;台湾中兴大学,材料科学及工程学系,台湾,台中
摘    要:因应新时代电子产品的需求,透明导电薄膜(Transparent Conductive Oxides,TCO)的应用也更加广泛,传统上是使用氧化铟锡(Indium Tin Oxide,ITO)薄膜为透明导电薄膜,但其在高温应用上较不稳定并且易放出毒性,因此,铝掺杂氧化锌薄膜(ZnO∶Al,AZO)有逐渐取代ITO的趋势。本论文将探讨掺杂不同铝含量的影响,并且就其光电特性加以说明,最后得到其光的透过率~85%、电阻率~7.3×10-3Ω·cm以及面粗糙度~28nm的铝掺杂氧化锌薄膜,其具有表面粗化、电流分布层及窗口层的作用。并且将掺铝的氧化锌薄膜应用于氮化镓发光二极管上,以掺铝氧化锌微结构作为透明传导层的氮化镓发光二极管(λD=530nm,300×300μm)在20mA的工作电流下,其正向电压值为3.3V,输出功率达1.7mW,并且由光学显微镜图可以得知,小电流注下其电流分布均匀。若将AZO制作参数再作适当优化调整,取代ITO作为p型氮化镓上的透明传导层的可行性应该很高。

关 键 词:铝掺杂氧化锌薄膜  表面粗化  电流分布层  窗口层

Growth of Al-doped ZnO Window Layer for GaN LED Application
WU Chia-cheng,LIN Po-rung,CHEN Tsai-ning,YU Ting-en,WUU Dong-sing. Growth of Al-doped ZnO Window Layer for GaN LED Application[J]. Chinese Journal of Luminescence, 2008, 29(3)
Authors:WU Chia-cheng  LIN Po-rung  CHEN Tsai-ning  YU Ting-en  WUU Dong-sing
Abstract:Effects of Al doping on the morphology and structure of Al-doped ZnO(AZO) were discussed. Analysis of AZO was carried out by scanning electron microscopy, photoluminescence and double-crystal X-ray diffraction. The diffraction peak position of the (002) plane was shifted to a lower angle with increasing Al concentration. It was found that the UV emission peak of near band edge emission in PL has a blue-shift to a region of higher photon energy with increasing Al concentration. The AZO epilayer was used as surface texturing, uniform current spreading, high transparent and thick window layer for achieving a highly efficient LED. AZO was deposited on the GaN-based LEDs as the transparent conducting layer. Light transmission above ~85% in the wavelength ranging from 400 to 700 nm, and AZO resistivity and roughness of ~7.3×10-3 Ω·cm and ~28 nm were obtained, respectively. The OM image shows that the LED with an AZO layer can reach a uniform current spreading at a relatively low current intensity (~0.02 mA).
Keywords:Al-doping ZnO  texturing surface  current spreading layer  window layer
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