The effect of oxygen rf discharge on pulsed laser deposition of oxide films |
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Authors: | A De Giacomo O De Pascale |
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Institution: | (1) Dipartment of Chemistry of Bari, Via Orabona 4, 70126 Bari, Italy;(2) CNR-IMIP sec. Bari, Via Orabona 4, 70126 Bari, Italy |
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Abstract: | In this work final results on TiO2 film deposition by Plasma Assisted Pulsed Laser Deposition (PAPLD) with an rf biased substrate are presented. In previous work it has been shown that PAPLD is an improvement over conventional PLD for the elimination of particulates in high refractive index thin film deposition. This paper will give a comparison between conventional PLD and PAPLD on the stoichiometry, morphology, and optical properties of deposited TiO2 films. It will be demonstrated that oxygen rf discharge during the PLD process makes incorporation of oxygen into the depositing films extremely effective. This effect of the rf discharge allows operation of the PLD process at a lower oxygen background pressure while enhancing the deposition rate. Also, the production of a good quality TiO2 film by PAPLD using a pure metal titanium target will be shown. PACS 79.20.Ds; 52.80.Pi |
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