Internal stress in plasma polymer films prepared by cascade arc torch polymerization

Thin plasma polymer films were deposited from several liquid monomers (mainly siloxane‐type monomers) in a low‐temperature cascade arc torch (CAT) reactor. The effects of monomer structures and plasma parameters on internal stress in the films were experimentally studied. By appropriately adjusting these factors, the internal stress in the film was reduced nearly two orders of magnitude from 10⁹ to 10⁷ dyn/cm². It was noted that the polymer films prepared from siloxane‐type monomers showed lower internal stress than their hydrocarbon counterpart. Fourier transform‐infrared spectroscopy (FTIR) studies indicated that a large amount of Si O Si structure from siloxane monomers, which are very flexible bonds, was preserved in the resultant plasma polymers. Ellipsometry results suggested that the internal stress can be qualitatively correlated with the refractive index of the plasma polymer film. © 1999 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 37: 1577–1587, 1999