Quantum yield and carbon contamination in thin‐film deposition reaction by core‐electron excitations |
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Authors: | Yoshiaki Imaizum Harutaka Mekaru Tsuneo Urisu |
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Abstract: | The excitation energy dependence of the reaction quantum yield and the carbon contamination in synchrotron radiation‐stimulated aluminum thin‐film deposition using the low‐temperature condensed layer of dimethylaluminum hydride (DMAH) were evaluated quantitatively in the vacuum ultraviolet region for the first time. It has been found that the core‐electron excitation gives a few tens to hundreds of times higher a reaction quantum yield than the valence‐electron excitations. This is explained qualitatively by the Auger‐stimulated desorption model. The carbon contamination decreases due to a site‐specific effect of the core‐electron excitations. Copyright © 1999 John Wiley & Sons, Ltd. |
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Keywords: | synchrotron radiation dimethylaluminum hydride core‐electron excitation thin‐film deposition |
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