基于原子转移自由基聚合制备新型螯合树脂及其吸附性能

以氯甲基化聚苯乙烯树脂(CMPS)为基质, 通过表面引发原子转移自由基聚合(SI-ATRP)反应将聚甲基丙烯酸缩水甘油酯(PGMA)接枝到树脂表面, 再与亚氨基二乙酸(IDA)反应, 制备了一种新型螯合树脂. 采用红外光谱、 元素分析及比表面积与微孔分析仪对其结构进行表征. 树脂表面甲基丙烯酸缩水甘油酯(GMA)接枝量和IDA含量及对Ni(Ⅱ), Cu(Ⅱ)和Pb(Ⅱ)的吸附容量均随聚合时间的延长而增大, 聚合时间为18 h时, 最大吸附容量分别为1.29, 1.19和0.83 mmol/g. 结果表明, SI-ATRP是制备高吸附容量及吸附容量可控的螯合树脂的可行方法.

Preparation and Adsorption Properties of New Chelating Resin Based on Chloromethylated Polystyrene Beads via Surface-initiated Atom Transfer Radical Polymerization

A new chelating resin was prepared by grafting poly(glycidyl methacrylate)(PGMA) onto the chloromethylated polystyrene beads via surface-initiated atom transfer radical polymerization(SI-ATRP), and followed by the reaction of epoxy groups in the grafted PGMA with iminodiacetic acid(IDA). The structure of chelating resin was characterized using Fourier transform infrared spectroscopy, elemental analysis, surface {area and porosity analyzer. An increase in the polymerization time leads to the increases in GMA grafting {yield, IDA binding amount and adsorption capacities of Ni(Ⅱ), Cu(Ⅱ) and Pb(Ⅱ). When the polymerization time was 18 h, the maximum sorption capacities of Ni(Ⅱ), Cu(Ⅱ) and Pb(Ⅱ) were 1.29, 1.19 and 0.83 mmol/g, respectively, which were higher than those on the same type of the reported absorbent. The results indicated ATRP is a feasible method to prepare chelating resin with higher and controlled adsorption {capacity.