| PMMA光盘基片光致聚合反应复制法工艺研究 |
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| 引用本文： | 耿永友,郑锐韬,王豪.PMMA光盘基片光致聚合反应复制法工艺研究[J].光学技术,1998(6). |
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| 作者姓名： | 耿永友 郑锐韬 王豪 |
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| 作者单位： | 中国科学院上海光学精密机械研究所 |
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| 摘 要： | 本文通过测量ＰＭＭＡ基片在光致聚合反应法复制过程中的形变和收缩应力，由此对其产生的机理作了一定的理论分析。通过在凝胶化后施加一定的压力能够减小形变和收缩应力。本文不仅描述了采用二阶段加压法工艺复制的ＣＤ唱片，还描述了用ＳＥＭ观察复制信息的微观形貌。
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| 关 键 词： | 光致聚合反应复制法 工艺 |
Study of replica technology via photopolymerization on PMMA substrate |
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| GENG Yongyou,ZHEN Ruitao,WANG Hao.Study of replica technology via photopolymerization on PMMA substrate[J].Optical Technique,1998(6). |
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| Authors: | GENG Yongyou ZHEN Ruitao WANG Hao |
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| Abstract: | In this paper, the deformation and shrinkage stress of PMMA substrate during the photopolymerization processing has been measured, the mechanism of them is also theoretically discussed here. Applying certain pressure in this procedure, after lacquers gelatinized, can prevent the deformation and shrinkage stress of PMMA substrate. Using this method, we make a copy of Ni Stamper of CD and give the microstructure of the copied information with SEM. |
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| Keywords: | optic disc photopolymerization technology |
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