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LP-MOVPE生长的低阈值1.3μm InGaAsP/InP压、张应变交替MQW激光器特性
引用本文:王志杰,陈博.LP-MOVPE生长的低阈值1.3μm InGaAsP/InP压、张应变交替MQW激光器特性[J].光子学报,1997,26(5):418-421.
作者姓名:王志杰  陈博
作者单位:国家光电子工艺中心,中国科学院半导体研究所!北京,100083
摘    要:本文国内首次报道了LP-MOVPE法生长高质量的压、张应变交替InGaAsP多量子阱结构的研制过程及其材料的高精度X-ray双晶摇摆衍射曲线和荧光光谱特性表征.在此材料基础之上制作的宽接触激光器阈值电流密度小于300A/cm2(腔长800μm),平面掩埋条形结构激光器平面掩埋异质结(PBH)条形结构多量子阱激光器阈值电流13~15mA.经过双腔面镀增透射膜后,其TE模与TM模自发发射谱光强差为3dBm,呈现偏振补偿特性.

关 键 词:低阈值  应变  激光器  LP-MOCVD
收稿时间:1996-07-31

LOW THRESHOLD 1.3μm INGaAsP/InP TENSILE AND COMPRESSIVELY STRAINED MQW LASERS GROWN BY LP-MOCVD
Wang Zhijie,Chen Bo,Wang Wei,Zhang Jizhi, Zhu Hongliang, Zhou Fan,Wang Yutian, Jin Caizheng, Ma Chaohua.LOW THRESHOLD 1.3μm INGaAsP/InP TENSILE AND COMPRESSIVELY STRAINED MQW LASERS GROWN BY LP-MOCVD[J].Acta Photonica Sinica,1997,26(5):418-421.
Authors:Wang Zhijie  Chen Bo  Wang Wei  Zhang Jizhi  Zhu Hongliang  Zhou Fan  Wang Yutian  Jin Caizheng  Ma Chaohua
Institution:Natind Research Center for Optoelectronics Technology, National Integrated optoelectronics Labortory, Institute of Smeiconductors, The Chinese Academy of Sciences, Beijing 100083
Abstract:High quality 1.3 μm InGaAsP/InP gain medium with tensile and compressive strained multi-quantum wells grown by Low Pressure Metalorganic Chemical Vapor Deposition(LP-MOCVD)was reported.The broad area threshold current density was less than 300A/cm2 with 800μm cavity length.The threshold current of Planer Buried Heterostructure (PBH) MQW laser was 13~15mA.The anti-reflection film coated PBH laser based on this structure was found to have the difference of transverse electric(TE) and transverse magnetic(TM) sp0ntaneous emission power only 3dB, it indicated approximately equal gain in both TE and TM modes.
Keywords:Low threshold  Strained compensated  Laser  LP-MOCVD  
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