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大气压射频等离子体化学气相沉积TiO2体系的发射光谱诊断
引用本文:常大磊,李小松,赵天亮,朱爱民.大气压射频等离子体化学气相沉积TiO2体系的发射光谱诊断[J].物理化学学报,2013,29(3):625-630.
作者姓名:常大磊  李小松  赵天亮  朱爱民
作者单位:Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, Liaoning Province, P. R. China
基金项目:国家自然科学基金(10835004,51077009)资助项目~~
摘    要:开展了大气压射频(RF)等离子体化学气相沉积(PCVD)TiO2放电体系的发射光谱诊断研究, 分别考察了氧气分压、钛酸四异丙酯(TTIP)分压和输入功率对氧原子谱线相对强度、氩原子激发温度、OH振动温度以及转动温度的影响. 结果表明: 随着氧气分压的增加, 氧原子谱线相对强度先迅速增加至峰值后缓慢下降, OH振动温度缓慢增加, 而氩原子激发温度和OH转动温度基本不变. 随着TTIP 分压的增加, 氧原子谱线相对强度下降, 氩原子激发温度没有明显变化, 而OH振动温度和转动温度增加. 随着输入功率的增加, 氧原子谱线相对强度下降, 氩原子激发温度、OH振动温度和转动温度升高.

关 键 词:大气压射频等离子体  介质阻挡放电  等离子体化学气相沉积  发射光谱诊断  TiO2  
收稿时间:2012-10-16
修稿时间:2012-12-27

Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO2 System with Atmospheric-Pressure Radio Frequency Plasma
CHANG Da-Lei LI Xiao-Song ZHAO Tian-Liang ZHU Ai-Min.Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO2 System with Atmospheric-Pressure Radio Frequency Plasma[J].Acta Physico-Chimica Sinica,2013,29(3):625-630.
Authors:CHANG Da-Lei LI Xiao-Song ZHAO Tian-Liang ZHU Ai-Min
Institution:Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, Liaoning Province, P. R. China
Abstract:Diagnosis of emission spectroscopy on chemical vapor deposition (PCVD) of TiO2 with atmospheric-pressure radio frequency (RF) plasma was studied. The dependences of relative intensity of atomic oxygen line, Ar excitation temperature, OH rotational and vibrational temperatures were investigated on partial pressures of O2 and titanium tetraisopropoxide (TTIP) and input power, respectively. The relative intensity of the atomic oxygen line rapidly increased to a maximum and slowly decreased with increasing O2 partial pressure. OH vibrational temperature gradually increased, whereas Ar excitation temperature and OH rotational temperature showed little change. The relative intensity of the atomic oxygen line decreased, Ar excitation temperature remained constant, and OH vibrational and rotational temperatures increased with increasing TTIP partial pressure. The relative intensity of atomic oxygen line decreased, whereas the Ar excitation temperature and OH vibrational and rotational temperatures increased with increasing input power.
Keywords:Atmospheric-pressure radio frequency plasma  Dielectric barrier discharge  Plasma chemical vapour deposition  Diagnosis of optical emission spectrum  2''  '''')  TiO2" target="_blank">">TiO2
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