Pulsed laser heating calculations incorporating vapourization

We present a scheme for solution of the heat flow equation in one-dimension incorporating melting and vapourization produced under pulsed laser irradiation. The method can be applied to pure materials as well as multilayered structures such as deposited films. The variation of physical properties with temperature can be easily taken into account. Results of calculation are presented for aluminium and for chromium and antimony layers deposited on aluminium. As a consequence of excessive vapourization at high energy densities, the melt depth and the melt duration do not increase beyond a certain limit. The resolidification front velocity is strongly dependent on energy density and can be controlled in an experiment by a careful choice of laser parameters. Some recent experimental data on laser treated chromium films are discussed in light of our calculations.