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Investigation of laser-induced plasma deposition of boron nitride
Authors:S Becker  H -J Dietze  G Keßler  H -D Bauer  W Pompe
Institution:(1) Central Institute of Isotope and Radiation Research, Academy of Sciences of the German Democratic Republic, Permoserstrasse 15, DDR-7050 Leipzig, German Democratic Republic;(2) Central Institute of Solid State Physics and Material Science, Academy of Sciences of the German Democratic Republic, Dresden, German Democratic Republic
Abstract:Laser ionization mass spectrometry (LIMS) was applied to the investigation of the composition of laser plasmas of three different boron nitride modifications (hexagonal agr-boron nitride with graphite structure, cubic beta-boron nitride with diamond structure and hexagonal gamma-boron nitride resembling the wurtzite type). Thin films in the 10 nm range were produced in the ion source of the laser mass spectrograph by laser-induced plasma deposition. So we could carry out the plasma diagnostic and the preparation of thin films under the same condition. The cluster distribution in laser plasma is independent of the structure of the BN target. An explanation of laser-induced plasma deposition of boron nitride from the results of mass spectrometric analysis of laser plasmas and of the analysis of deposited thin films (TEM, EELS) was derived.
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