Structure sensitivity of methane oxidation on Pt/SiO2 of widely varying dispersity |
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| Authors: | M Kobayashi T Kanno A Konishi and H Takeda |
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| Institution: | (1) Department of Industrial Chemistry, Kitami Institute of Technology, 090 Kitami, Hokkaido, Japan |
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| Abstract: | Methane oxidation on Pt/SiO2 is a structure sensitive reaction at 260–335°C. The higher the percentage exposed, the lower the turnover frequency with decreasing reaction order in PCH
4 from 1.0 to 0.5 and slightly decreasing the activation energies of reaction from 90 to 80 kJ/mol, caused by the shift of rate-determining step.
          Pt/SiO2   260–335°C         .      ,     PCH
4 1,0 0,5  90 80 /.  , .
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