Regeneration by Membrane Electrolysis of an Etching Solution Based on Copper Chloride |
| |
Authors: | D. Yu. Turaev S. S. Kruglikov A. V. Parfenova |
| |
Affiliation: | (1) Mendeleev Russian University of Chemical Engineering, Moscow, Russia |
| |
Abstract: | Regeneration of an acid solution for copper etching, based on copper(II) chloride, hydrochloric acid, and ammonium chloride, by membrane electrolysis was studied. The concentrations of copper(I, II) ions in the cathode and anode spaces, current efficiency, degree of copper recovery, and specific consumption of electric power at different quantities of electricity passed through the electrolyzer were measured. The influence exerted by the current density on the electric power expenditure for recovery of metallic copper was examined. The anode current efficiency by chlorine was determined with a spent etching solution and an H2SO4 solution used as anolyte. |
| |
Keywords: | |
本文献已被 SpringerLink 等数据库收录! |
|