Effect of 100 MeV Si7+ ions’ irradiation on Pd/n-GaAs Schottky diodes

Pd/n-GaAs realized devices (junction made on a virgin substrate prior to irradiation) and Pd/n-GaAs fabricated devices (junction realized after the virgin substrate irradiation) have been irradiated with 100?MeV Si⁷⁺ ions for the varying fluence of 10¹²–10^13?ions/cm². The devices have been characterized by I–V and C–V techniques for an electrical response. The electrical characterization of these devices shows the presence of interfacial layer. Moreover, the C–V characteristics show strong frequency dependence behavior, which indicates the involvement of interfacial charge layer with deep electron states. The hydrogenation of these devices has not caused any significant change in the electrical (I–V and C–V) characteristics. The observed results have been discussed in the realm of radiation-induced defects, which cause the carrier removal and compensation phenomena to cause the observed high resistivity and filling and unfilling of these traps’ level to cause strong frequency dependence behavior.