| Abstract: | Plasma polymerized (PP) fluoropolymer films have been synthesized by the plasma copolymerization of hexafluoropropylene (HFP) and a nonpolymerizable gas. Plasma etching was inhibited by fluorine scavenging and HF formation on the addition of hydrogen and was accelerated on the addition of oxygen. Nitrogen, oxygen, and hydrogen were incorporated into the deposited polymer molecules when added to the HFP plasma. The polar component of surface tension increased on nitrogen addition and the dispersive component on hydrogen addition. The higher surface tension drove the deposition and coalescence of smaller particles from the gas phase polymerization yielding smooth surfaces. The significant drop in breakdown voltage on the addition of nitrogen was attributed to a different conduction mechanism in the relatively polar PP fluoropolymer film. © 1996 John Wiley & Sons, Inc. |
