Novel technique for characterizing feature profiles in photolithography process |
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Affiliation: | Fan Wang,Hailiang Lu,Qingyun Zhang,Anatoly Burov Shanghai Micro Electronics Equipment Co.,Ltd,Shanghai 201203,China |
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Abstract: | A novel angle-resolved scatterometer based on pupil optimization for feature profile measurement in a photolithography process is proposed.The impact of image sensor errors is minimized by optimizing the intensity distribution of the incident light using a spatial light modulator.The scatterometry sensitivity of feature measurement at different polarization conditions is calculated using the rigorous coupled-wave and first-order analyses,and the reproducibility of the scatterometer is evaluated.The results show that the sensitivity and reproducibility of the angle-resolved scatterometer increase by 90% and 40% with pupil optimization,respectively. |
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