Decomposition of alkanethiols adsorbed on Au (1 1 1) at low temperature |
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| Affiliation: | 1. Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan;2. National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan;1. Dipartimento di Scienze–Sezione Geologia, Università Roma Tre, Largo San Leonardo Murialdo 1, Roma, Italia;2. Istituto Nazionale di Geofisica e Vulcanologia, Sezione di Roma 1, Via Vigna Murata 509, Roma, Italia;3. Istituto Nazionale di Geofisica e Vulcanologia, Sezione di Bologna, Via Donato Creti 12, Bologna, Italia, Italy;4. Parco Regionale dell''Appia Antica, via Appia Antica 42, Roma, Italy;5. Geological Survey of Japan, AIST Site 7, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8567, Japan |
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| Abstract: | The adsorption and desorption of butanethiol (CH3(CH2)3SH: C4), hexanethiol (CH3(CH2)5SH: C6) and octanethiol (CH3(CH2)7SH: C8) on Au (1 1 1) under vacuum condition have been studied by temperature programmed desorption (TPD). Desorptions of thiolate radical species were observed for C6 and C8. Connecting the desorption temperatures of parent thiols from the first layer and that of hydrogen, we were able to find a condition for thiolate radicals to be desorbed from the surface. |
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