LiNbO3 and LiTaO3 thin films deposited by chemical and/or physical processes |
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| Institution: | 1. University of Bologna;2. IRCCS Istituto Ortopedico Rizzoli;1. Institute of Physics, Jan Dlugosz University in Czestochowa, Al. Armii Krajowej 13/15, 42-200, Czestochowa, Poland;2. Physics Dep., Faculty of Science, King Khalid University, P. O. Box, 9004, Abha, Saudi Arabia;3. PhysicsDep., Faculty of Science, Al- Azhar University, Assiut Branch, Assiut, Egypt;4. AGH-University of Science and Technology, Faculty of Materials Science and Ceramics, Al. Adama Mickiewicza 30, 30-059, Kraków, Poland;5. Institute of Physics, Czestochowa University of Technology, al. Armii Krajowej 19, 42-200, Czestochowa, Poland;1. Istituto per lo Studio dei Materiali Nanostrutturati (ISMN) – CNR, Via Salaria Km 29300, 00015 Monterotondo Stazione, Rome, Italy;2. Istituto per i Processi Chimico-Fisici (CNR-IPCF), Viale F. Stagno D’Alcontres 37, 98158 Messina, Italy |
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| Abstract: | Lithium niobate LiNbO3 thin films were deposited onto silicon (111) Si and sapphire (001) AI2O3 single crystal substrates by the pyrosol and/or r.f. sputtering processes. A matrix of experiments was designed to determine the effects of several experimental parameters on the resulting film quality (stoichiometry, crystallization state) and properties. Under optimized conditions, requiring the combination of the two above-mentioned deposition techniques, <001 > oriented polycrystalline LiNbO3 films were grown which exhibit homogeneous and columnar grain structures with the <c > -polar axis normal to the substrate surface. |
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