Depth profile measurement in PMMA-PTFE sandwich structure using dynamic FAB-MS |
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| Institution: | 1. National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor, 077125, Romania;2. Institut de Recherche sur la Fusion par confinement Magnétique IRFM, Cadarache, France;3. KTH Royal Institute of Technology, Stockholm, Sweden;4. Rudjer Boskovic Institute, Bijenicka 54, Zagreb, Croatia |
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| Abstract: | Fast atom bombardment mass spectroscopy (FAB-MS) is used to perform depth profile measurement of an artificial PMMA-PTFE thin film sandwich. It is shown that either the total ion current change or characteristic polymer fragment intensity changes (with respect to time) can be used to locate and study the polymer-polymer interface. Primary and secondary particle beam effects (crater-edge effects, radiation damage accumulation and surface morphology development) are documented and the potential for more advanced FAB-MS polymer-polymer interface studies based on further optimization of experimental conditions is discussed. |
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