首页 | 本学科首页   官方微博 | 高级检索  
     


A facile two-step etching method to fabricate porous hollow silica particles
Authors:Qingnan Meng  Siyuan Xiang  Kai Zhang  Mingyang Wang  Xinyuan Bu  Pengfei Xue  Liqun Liu  Hongchen Sun  Bai Yang
Affiliation:State Key Laboratory of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, PR China.
Abstract:We report here the fabrication of hollow silica particles with mesopores larger than 10 nm on their wall via a facile two-step etching method. Different from the conventional template method, the new method uses the silica particles as starting materials, which were synthesized using the well-known Stöber method. In the hollow silica preparation, first, we gently etch the silica particles with a NaOH solution without using template molecules to make them porous. Then, we coat the porous silica particles with poly-dimethyldiallylammonium chloride (PDDA) and treat the PDDA-coated porous silica with an ammonia solution to form the hollow silica nanospheres. In this study, we found that the NaOH dosage and ammonia concentration have significant impact on the morphology of the final products. Adsorption was also studied and results show that the hollow nanospheres can effectively uptake protein-based biomolecules (hemoglobin).
Keywords:
本文献已被 ScienceDirect PubMed 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号