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Cathode etching rate in abnormal glow discharges |
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| Authors: | D. Czekaj E. K. Hollmann A. B. Kozirev V. A. Volpias A. G. Zaytsev |
| Affiliation: | (1) Centre for Technical Progress, 1b M. Buczka St., PL-40-955 Katowice, Poland;(2) Electrical Engineering Institute, V. I. Ulyanov (Lenin), 5 Prof. Popova St., SU-197022 Leningrad, USSR |
| Abstract: | The cathode etching rate in an abnormal glow discharge was calculated taking into account sputtering both by ions and energetic neutrals originating in cathode dark space due to the charge exchange collisions. The advantage of the model proposed is the evaluation of energetic neutral scattering by the sputtering gas. |
| Keywords: | 79.20 52 |
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