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重离子在14-nm FinFET SRAM器件引起的单粒子翻转
引用本文:Lihua MO,Bing YE,Jie LIU,Zhangang ZHANG,Teng TONG,Youmei SUN,Jie LUO. 重离子在14-nm FinFET SRAM器件引起的单粒子翻转[J]. 原子核物理评论, 2021, 38(3): 327-331. DOI: 10.11804/NuclPhysRev.38.2021015
作者姓名:Lihua MO  Bing YE  Jie LIU  Zhangang ZHANG  Teng TONG  Youmei SUN  Jie LUO
作者单位:1.中国科学院近代物理研究所,兰州 730000
摘    要:通过重离子实验研究了14-nm FinFET工艺静态随机存取存储器(SRAM)的单粒子翻转(SEU)特性。通过使用Weibull函数拟合SEU截面获得该器件的线性能量转移(LET)阈值:0.1 MeV/(mg/cm2)。对多位翻转(MBU)贡献的统计结果表明,当LET等于40.3 MeV/(mg/cm2)时,MBU的占比超过95%。此外,FinFET SRAM的SEU截面呈现出与Fin相关的入射角度的各向异性。该研究对基于FinFET工艺的抗辐射CMOS集成电路(IC)的设计具有一定的指导作用。

关 键 词:FinFET SRAM   重离子   单粒子翻转   角度效应
收稿时间:2021-02-23

Single-event Upsets (SEUs) Induced by Heavy Ions in 14-nm FinFET SRAM
Lihua MO,Bing YE,Jie LIU,Zhangang ZHANG,Teng TONG,Youmei SUN,Jie LUO. Single-event Upsets (SEUs) Induced by Heavy Ions in 14-nm FinFET SRAM[J]. Nuclear Physics Review, 2021, 38(3): 327-331. DOI: 10.11804/NuclPhysRev.38.2021015
Authors:Lihua MO  Bing YE  Jie LIU  Zhangang ZHANG  Teng TONG  Youmei SUN  Jie LUO
Affiliation:1.Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China2.University of Chinese Academy of Sciences (UCAS), Beijing 100049, China3.Science and Technology on Reliability Physics and Application Technology of Electronic Component Laboratory, Guangzhou 510610, China4.Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China
Abstract:The characteristic of single-event upset(SEU) in a 14-nm bulk fin field-effect transistor (FinFET) static random access memory(SRAM) is investigated by heavy-ion experiments. The linear energy transfer(LET) threshold 0.1 MeV/(mg/cm2) is obtained by fitting the SEU cross-section using the Weibull function. The contribution of multiple-bit upset(MBU) is investigated. The results show that when the LET is equal to 40.3 MeV/(mg/cm2), greater than 95% of SEU comes from the MBU. Additionally, the SEU cross-section of the FinFET SRAM presents anisotropies for incident angles associated with the fin direction. This research has a certain kind of guiding role in designing of radiation-hardened complementary metal-oxide semiconductor(CMOS) integrated circuits(ICs) based on FinFET technology.
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