Evaluation of acid-base properties of ammonia plasma-treated polypropylene by means of XPS

Acid-base properties of ammonia plasma-treated polypropylene (APTPP) were characterized by X-ray photoelectron spectroscopy (XPS) in conjunction with the molecular probe technique and using chloroform (TCM) as a reference Lewis acid. It is shown that TCM is retained by the basic surfaces of APTPP but not by the untreated PP. The retention of TCM is shown to be entirely due to the formation of TCM:APTPP acid-base complexes. This is supported by the C12p^3/2 binding energy (BE) and the shape of the Cl2p peak from the adsorbed TCM. ΔH^AB, the heat of TCM:APTPP acid-base interaction was found to be in the range of 3.1–4.3 kcal/mol using a published Cl2p^3/2 BE−ΔH^AB correlation. This ΔH^AB compares remarkably well with the values of 4.3–4.9 kcal/mol determined for TCM:amine complexes, and shows indeed that TCM is complexed by nitrogen containing basic groups grafted at the surface. However, the TCM/N ratio has an optimal value up to 1 second of plasma treatment and then decreases sharply, showing that less specific interaction sites are accessible at the surface for longer treatment times. This parallels previous findings about the metallization of APTPP by aluminium which was found to be optimal for treatment times lower than 1 second in our experimental conditions. This work shows that XPS can now indeed be used to quantitatively assess the acid-base properties of modified polymer surfaces.