Laser ablation and micropatterning of thin TiN coatings |
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Authors: | TV Kononenko SV Garnov SM Pimenov VI Konov V Romano B Borsos HP Weber |
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Institution: | (1) General Physics Institute, Vavilov str. 38, 117942 Moscow, Russia, RU;(2) University of Bern, Institute of Applied Physics, Sidlerstrasse 5, CH-3012 Bern, Switzerland, CH |
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Abstract: | Laser ablation of thin TiN films deposited on steel substrates has been studied under wide-range variation of irradiation
conditions (pulsewidth, wavelength, energy density and spot size). It has been demonstrated that both picosecond (150–300 ps)
and nanosecond (5–9 ns) laser pulses were suitable for controllable ablation and microstructuring of a 1-μm-thick TiN film
unlike longer 150-ns pulses. The ablation rate was found to be practically independent of the wavelength (270–1078 nm) and
pulsewidth (150 ps–9 ns), but it increased substantially when the size of a laser spot was reduced from 15–60 μm to 3 μm.
The laser ablation technique was applied to produce microstructures in the thin TiN films consisting of microcraters with
a typical size of 3–5 μm in diameter and depth less than 1 μm. Tests of lubricated sliding of the laser-structured TiN films
against a steel ball showed that the durability of lubricated sliding increased by 25% as compared to that of the original
TiN film.
Received: 28 July 1999 / Accepted: 17 April 2000 / Published online: 20 September 2000 |
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Keywords: | PACS: 42 62 -b 81 40 Pq 81 65 Cf |
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