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VHF-PECVD低温制备微晶硅薄膜的拉曼散射光谱和光发射谱研究
引用本文:张晓丹,赵颖,朱锋,魏长春,吴春亚,高艳涛,侯国付,孙建,耿新华,熊绍珍. VHF-PECVD低温制备微晶硅薄膜的拉曼散射光谱和光发射谱研究[J]. 物理学报, 2005, 54(1): 445-449
作者姓名:张晓丹  赵颖  朱锋  魏长春  吴春亚  高艳涛  侯国付  孙建  耿新华  熊绍珍
作者单位:南开大学光电子所,天津 300071
基金项目:国家重点基础研究发展规划 (批准号:G2000028202, G2000028203) ,教育部重大项目 (批 准号:02167) 和国家高技术研究发展计划(批准号: 2002AA303261) 资助的课题.
摘    要:采用拉曼散射光谱和PR650光谱光度计对VHF-PECVD制备的微晶硅薄膜进行了结构表征和在线监测研究.结果表明:功率对材料的晶化率(χc)有一定的调节作用,硅烷浓度大,微调作用更明显;SiH*的强度只能在一定的范围内表征材料的沉积速率,功率大相应的速率反而下降;I[Hα*]/I[SiH*]强度比值反映了材料晶化程度,此结果和拉曼散射光谱测试结果显示出一致性;I[Hβ*]/I[Hα*]的强度比表明氢等离子体中的电子温度随功率的增大而逐渐降低.关键词:甚高频等离子体增强化学气相沉积微晶硅拉曼散射谱光发射谱

关 键 词:甚高频等离子体增强化学气相沉积  微晶硅  拉曼散射谱  光发射谱
收稿时间:2004-02-13

A study of Raman and optical emission spectroscopy on microcrystalline silicon films deposited by VHF-PECVD
Zhang Xiao-Dan,Zhao Ying,Zhu Feng,Wei Chang-Chun,Wu Chun-Y,Gao Yan-Tao,Hou Guo-Fu,Sun Jian,Geng Xin-Hua and Xiong Shao-Zhen. A study of Raman and optical emission spectroscopy on microcrystalline silicon films deposited by VHF-PECVD[J]. Acta Physica Sinica, 2005, 54(1): 445-449
Authors:Zhang Xiao-Dan  Zhao Ying  Zhu Feng  Wei Chang-Chun  Wu Chun-Y  Gao Yan-Tao  Hou Guo-Fu  Sun Jian  Geng Xin-Hua  Xiong Shao-Zhen
Abstract:Structural properties of microcrystalline silicon films deposited by very high f requency plasma_enhanced chemical vapor deposition(VHF_PECVD) and on-line monit or were studied using Raman and optical emission spectroscopy. The results obta ined showed that the discharge power has a modulation function on crystalline volume fraction (χc) of materials. A larger silane concentration means a stronger modulation function. The intensity of SiH* peak can characterize the deposition rate in a certain range, however the higher power indicates the lower deposition rate, and the ratio of intensity Hα* to SiH* peak value reflects the extent of crystallinity which is consistent with the result obtained from Raman measurement. In addition, the ratio of I[Hβ *]/ I[Hα*] indicates the decrease of electronic temperatur e in hydrogen plasma with the increase of discharge power.
Keywords:very high frequency plasma enhanced chemical vapor deposition   microcrystalline silicon   Raman spectroscopy   optical emission spectroscopy
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