电解有机溶液法在Si表面制备类金刚石薄膜及退火对其结构的影响

在对不同有机溶剂分子结构分析的基础上,选取甲醇、DMF(N,N-二甲基甲酰胺)和乙腈溶液为碳源,以脉冲直流电源电解有机溶液的方法在Si片上制得了含氢类金刚石薄膜(DLC薄膜),并研究了退火对薄膜结构的影响.通过X射线光电子能谱(XPS),喇曼(Raman)和红外(IR)光谱对薄膜的结构进行了分析表征.XPS表明薄膜的主要成分为C,喇曼光谱显示所得薄膜为典型DLC薄膜.喇曼和红外光谱还表明,膜中含有大量H并且主要键合于sp³碳处.随着退火的进行薄膜中的H被去除.随温度升高薄膜电阻率的下关键词：类金刚石薄膜退火

ELECTRODEPOSITION OF DIAMOND-LIKE CARBON FILMS FROM ORGANIC SOLVENTS AND EFFECTS OF ANNEALING ON THE FILM STRUCTURE

After analyzing the molecular structure of several organic solvents we select methanol, N,N-dimethylformamide (DMF) and acetonitrile as the carbon source to deposit diamond-like carbon (DLC) films on Si plate with a pulse-modulated power. The deposition reaction can be facilitated by increasing temperature or by decreasing separation between the electrodes. The films were characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy and Raman spectroscopy sequentially. The results showed that the films were typical hydrogenated DLC films. Hydrogen was removed and the primary bonding in the films changed gradually from sp³-bonded carbon to sp²-bonded carbon as annealing proceeded, i.e. the film underwent a graphitization process. Comparing the results of different solvents, we discover that the methyl group of the solvents seems to be the functional group in forming the DLC films.