An improvement on the adhesion‐strength of laminated ultra‐high‐molecular‐weight polyethylene fabrics: surface‐etching/modification using highly effective helium/oxygen/nitrogen plasma treatment |
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| Authors: | Jen‐Taut Yeh Yu‐Ching Lai Maw‐Cherng Suen Cheng‐Chi Chen |
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| Affiliation: | 1. Graduate School of Polymer Engineering, National Taiwan University of Science and Technology, Taipei, Taiwan 10673, ROC;2. Department of Materials and Fiber Engineering, Nanya Institute of Technology, Jongli, Taoyuan, Taiwan 32091, ROC;3. Department of Chemical and Materials Engineering, Nanya Institute of Technology, Jongli, Taoyuan, Taiwan 32091, ROC |
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| Abstract: | In this study, helium/oxygen/nitrogen (He/O2/N2)‐plasma was used to etch/modify the surface of ultra‐high‐molecular‐weight polyethylene (UHMWPE) fiber. After coated with polyurethane (PU), the plasma treated UHMWPE fabrics were laminated. It was found that the values of peeling strength between the laminated UHMWPE fabrics treated with He/O2/N2‐plasma were significantly higher (3–4 times) than that between pristine fabrics. The hydrophilic property and the value of the surface roughness of the UHMWPE fibers increased significantly after treated with He/O2/N2‐plasma. The mechanism of the oxidation/degradation of the polymers on the surface of the UHMWPE fiber during He/O2/N2‐plasma treatment was suggested. In addition, it was found that the higher content of functional groups (carbonyl, aldehyde, and carboxylic acid) on fiber surface and the higher value of surface roughness of the UHMWPE fiber treated with He/O2/N2‐plasma could significantly improve the adhesion‐strength of the laminated UHMWPE fabric. Especially, the micro‐aperture on the surface of UHMWPE fiber caused by the strenuous etching of He/O2/N2‐plasma treatment was also an important factor on improving the adhesion‐strength between the laminated UHMWPE fabrics. Copyright © 2010 John Wiley & Sons, Ltd. |
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| Keywords: | peeling strength plasma etching surface roughness adhesion polyethylene |
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