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Hafnia nanoparticles – a model system for graphene growth on a dielectric
Authors:Piran R Kidambi  Bernhard C Bayer  Robert S Weatherup  Rolf Ochs  Caterina Ducati  D Vinga Szabó  Stephan Hofmann
Institution:1. Department of Engineering, University of Cambridge, Cambridge CB3 0FA, UK;2. Institute of Applied Materials – Materials Process Technology, Karlsruhe Institute of Technology (KIT), Hermann‐von‐Helmholtz‐Platz 1, 76344 Eggenstein‐Leopoldshafen, Germany;3. Department of Materials Science and Metallurgy, University of Cambridge, Cambridge CB2 3QZ, UK
Abstract:We study graphene growth on hafnia (HfO2) nanoparticles by chemical vapour deposition using optical microscopy, high resolution transmission electron microscopy and Raman spectroscopy. We find that monoclinic HfO2 nanoparticles neither reduce to a metal nor form a carbide while nucleating nanometer domain‐sized few layer graphene. Hence we regard this as an interesting non‐metallic catalyst model system with the potential to explore graphene growth directly on a (high‐k) dielectric.
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Keywords:graphene  chemical vapour deposition  oxide catalysts  hafnium oxide  nanoparticles
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