Quantitative XPS-analysis of tantalum-containing amorphous carbon films |
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| Authors: | M Grischke A Brauer C Benndorf F Thieme and P Willich |
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| Institution: | (1) Surface Chemistry Division, Department of Physical Chemistry, University of Hamburg, Bundesstrasse 45, D-2000 Hamburg 13, Federal Republic of Germany;(2) Forschungslaboratorium Hamburg, Philips GmbH, Vogt-Kölln-Strasse 54, D-2000 Hamburg 54, Federal Republic of Germany |
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| Abstract: | Summary Amorphous carbon films with different amounts of tantalum, normally used as hard coatings with low friction coefficients ( <0.2), were analysed with XPS. Besides the indentification of different chemical states, a quantitative analysis was performed. In this paper we focus on the influence of surface contaminations and on the cleaning process (Ar sputtering) on quantitative XPS data. Depth profiles are presented. To verify the analytical results, the atomic concentrations are determined using own and published reference data. The quantitative XPS data were compared to EPMA measurements (a not surface-sensitive analysing technique), which reflect directly the bulk concentrations.
Quantitative XPS-Analyse von Ta-haltigen amorphen Kohlenstoff-Filmen |
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