| 缩小投影电子束曝光原理论证机 |
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| 引用本文： | 彭开武,顾文琪,吴桂君,张福安. 缩小投影电子束曝光原理论证机[J]. 微细加工技术, 2001, 0(4): 6-11 |
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| 作者姓名： | 彭开武 顾文琪 吴桂君 张福安 |
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| 作者单位： | 中科院电工所, |
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| 摘 要： | 系统阐述了缩小投影（或纳米投影）电子束曝光技术的原理，以及如何将一台透射电镜改装为原理论证机的主要过程。内容包括机械结构的变动、电子光路的选择、调焦及曝光、成像系统的逐步演化、实验曝光结果与结论。
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| 关 键 词： | 电子束曝光 透射电镜 微细加工 |
| 文章编号： | 1003-8213(2001)04-006-06 |
Proof-of-Concept System for Projection Electron-Beam Lithography with Demagnification Imaging(PELDI) |
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| PENG Kai?wu,GU Wen?qi,WU Gui?jun,ZHANG Fu?an. Proof-of-Concept System for Projection Electron-Beam Lithography with Demagnification Imaging(PELDI)[J]. Microfabrication Technology, 2001, 0(4): 6-11 |
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| Authors: | PENG Kai?wu GU Wen?qi WU Gui?jun ZHANG Fu?an |
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| Abstract: | The principle of the Projection Electron?beam Lithography with Demagnification Imaging(PELDI)and the process to rebuild a PELDI proof?of?concept system with a Transmission Electron Microscope(TEM)are introduced in detail.The contents are as follows:the changes of the mechanical structure,the selection of electron?optics,focus and exposure, the evolvement of the imaging system and the results of the experimental exposure. |
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| Keywords: | PELDI TEM microfabrication |
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