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掺In对反型AlGaAs/GaAs异质界面质量的改善及其应用
引用本文:尚勋忠,王文冲,郭丽伟,吴曙东,牛萍娟,黄绮,周均铭. 掺In对反型AlGaAs/GaAs异质界面质量的改善及其应用[J]. 半导体学报, 2004, 25(9): 1128-1131
作者姓名:尚勋忠  王文冲  郭丽伟  吴曙东  牛萍娟  黄绮  周均铭
作者单位:中国科学院物理研究所,北京,100080;中国科学院物理研究所,北京,100080;中国科学院物理研究所,北京,100080;中国科学院物理研究所,北京,100080;中国科学院物理研究所,北京,100080;中国科学院物理研究所,北京,100080;中国科学院物理研究所,北京,100080
摘    要:研究了Al Ga As层掺1%的In对Al Ga As/Ga As量子阱光致发光谱的半峰宽的影响.2 5 K的光致发光结果表明,In作为表面活化剂能有效改善Al Ga As/Ga As异质界面的粗糙度.将此方法应用到反型Al Ga As/Ga As高电子迁移率晶体管(HEMT)材料结构中,Hall测量表明该方法能有效提高反型HEMT的电学性能

关 键 词:量子阱  高电子迁移率晶体管  界面粗糙度  光致发光  表面活化剂
文章编号:0253-4177(2004)09-1128-04
修稿时间:2003-08-18

Indium Doping to Improve Heterojunction of AlGaAs/GaAs and Its Application
Shang Xunzhong,Wang Wenchong,Guo Liwei,Wu Shudong,Niu Pingjuan,Huang Qi and Zhou Junming. Indium Doping to Improve Heterojunction of AlGaAs/GaAs and Its Application[J]. Chinese Journal of Semiconductors, 2004, 25(9): 1128-1131
Authors:Shang Xunzhong  Wang Wenchong  Guo Liwei  Wu Shudong  Niu Pingjuan  Huang Qi  Zhou Junming
Abstract:Effects of In doping on the optical properties of AlGs/Gs quantum wells (QWs ) and the electrical properties of inverted AlGs/Gs high electron mobility t ransistors (HEMTs) are investigated.It is found that a little In incorporation i n AlGs layers can decrease the photoluminescence linewidths of AlGs/Gs QWs drastically and a little In doping in AlGs layer can significantly increase t he electron mobilities of inverted AlGs/Gs HEMTs at 77K.All these results de monstrate that In doping can reduce the interface roughness due to In as a surfa ctant which can enhance the surface migration of Al adatoms during molecular bea m epitaxy.
Keywords:quantum wells  high electron mob ility transistor  interface roughness  photoluminescence  surfactant
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