对流自组装2维胶体晶体成膜趋势和覆盖率

从自组装理论出发, 分析对流自组装2维胶体晶体中空白、条纹区域出现的机理，并在实验上予以验证。通过研究得知, 2维胶体晶体的自组装过程呈现空白、条纹、大面积单层、双层条纹的趋势。从胶体晶体覆盖率的角度出发研究2维胶体晶体的组装参数与质量之间的关系，结果表明:胶体晶体的总覆盖率与基片提拉速度倒数呈线性正比，和粒子体积分数呈反比例函数关系; 受到多种因素的影响，大面积2维胶体晶体总是伴随着一定比例的空白区域和双层区域出现，提拉法所能获得的最大单层覆盖率为95%。

Film-formation trend and film coverage percentage of continuous convective self-assembling of 2D colloidal crystals

The dynamics of polystyrene(PS) micro-spheres in thin layers of continuous convective self-assembly of 2D colloidal crystals was studied systemically. The mechanisms of void and stripe patterns were analyzed, based on the model of assembly. To explain the film-formation trend, a mathematical model including the coverage percentage of colloidal crystals, the substrate withdrawing velocity and the colloidal suspension concentration was derived. The result shows that higher particle volume fraction and lower substrate withdrawing velocity lead to larger coverage percentage of colloidal crystals. Void and multilayer flaws always appear in the self-assembled 2D colloidal crystals, and the monolayer coverage percentage can be 95%.