扫描质子微探针质子束刻写

质子束刻写技术利用MeV能量的聚焦质子束对抗蚀剂材料直接刻写m甚至nm尺度微结构。研究了质子束刻写中抗蚀剂胶层样品厚度与涂层机旋转速度的关系以及曝光对抗蚀剂的影响，解决了质子束刻写中抗蚀剂厚胶层样品的制备、固化、显影等技术问题，利用扫描质子微探针系统，在正型抗蚀剂胶层上刻写出m尺度的海宝图形、 双矩形结构，在负型抗蚀剂上刻写出m尺度的平行线条、十字形微结构。

Proton beam writing with scanning proton microprobe

Proton beam writing(PBW) is a direct-writing technique that uses a highly focused MeV proton beam to pattern structures of micro- or nano-dimensions in a suitable resist material. The PBW instrumentation was established on the scanning proton microprobe beamline of Key Laboratory of Nuclear Analysis Techniques (Shanghai Institute of Applied Physics, CAS). The study of spin-coating resist layer and developing technology was carried out. A Haibao outline and a double-rectangular micro-structure were fabricated on the positive resist layers; the parallel lines and a crisscross micro-structure were fabricated on the negative resist layers.