| 大口径反射元件环形抛光工艺 |
| |
| 引用本文： | 谢磊,马平,刘义彬,游云峰,鄢定尧. 大口径反射元件环形抛光工艺[J]. 强激光与粒子束, 2012, 24(7): 1687-1690 |
| |
| 作者姓名： | 谢磊 马平 刘义彬 游云峰 鄢定尧 |
| |
| 作者单位： | 1.成都精密光学工程研究中心, 成都 61 0041 |
| |
| 基金项目： | 国家高技术发展计划项目 |
| |
| 摘 要： | 根据环形抛光的加工特点，研究了大口径反射元件的环形抛光加工工艺。在4 m环抛机上进行了610 mm440 mm85 mm的大口径反射元件加工工艺实验，研究了修正盘及工件盘转速与元件面形的关系、修正盘及工件盘位置与元件面形的关系、沥青盘槽形与元件面形的关系。研究结果表明，通过对修正盘及工件盘转速、修正盘及工件盘位置、沥青盘槽形等工艺参数的优化控制，能够得到大口径反射元件面形的高效收敛，元件最高面形精度优于/6(=632.8 nm)，验证了加工工艺的有效性。
|
| 关 键 词： | 环形抛光 大口径反射元件 工艺优化 转速 槽形 |
| 收稿时间： | 2011-11-23 |
Annular lapping of large-aperture reflective component |
| |
| Xie Lei , Ma Ping , Liu Yibin , You Yunfeng , Yan Dingyao. Annular lapping of large-aperture reflective component[J]. High Power Laser and Particle Beams, 2012, 24(7): 1687-1690 |
| |
| Authors: | Xie Lei Ma Ping Liu Yibin You Yunfeng Yan Dingyao |
| |
| Affiliation: | 1.Chengdu Fine Optical Engineering Research Center,Chengdu 610041,China |
| |
| Abstract: | The paper investigates the annular lapping process of large-aperture reflective component. A 610 mm×440 mm×85 mm reflective component was processed by a lapping machine with a 4 m-diameter lapping disk. In order to improve the surface flatness of the optical component， the rotating speeds and locations of the conditioner and the workpiece ring， and the groove shape on the asphalt plate were optimized. The surface flatness converse more efficiently, with the best value of λ/6(λ=632.8 nm), after optimization. Thus annular lapping is suitable for processing large-aperture optical components． |
| |
| Keywords: | annular lapping large-aperture reflective component process optimization rotating speed groove shape |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
| 点击此处可从《强激光与粒子束》浏览原始摘要信息 |
|
点击此处可从《强激光与粒子束》下载免费的PDF全文 |
