Low-k periodic mesoporous organosilica with air walls: POSS-PMO |
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Authors: | Seino Makoto Wang Wendong Lofgreen Jennifer E Puzzo Daniel P Manabe Takao Ozin Geoffrey A |
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Institution: | Kaneka Corporation, 5-1-1, Torikai-nishi, Settsu, Osaka, Japan 566-0072. |
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Abstract: | Periodic mesoporous organosilica (PMO) with polyhedral oligomeric silsesquioxane (POSS) air pockets integrated into the pore walls has been prepared by a template-directed, evaporation-induced self-assembly spin-coating procedure to create a hybrid POSS-PMO thin film. A 10-fold increase in the porosity of the POSS-PMO film compared to a reference POSS film is achieved by incorporating ~1.5 nm pores. The increased porosity results in a decrease in the dielectric constant, k, which goes from 2.03 in a reference POSS film to 1.73 in the POSS-PMO film. |
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