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Epitaxial growth of metals with high Ehrlich–Schwoebel barriers and the effect of surfactants |
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| Authors: | J Camarero V Cros MJ Capitán J Álvarez S Ferrer MA Niño JE Prieto L Gómez J Ferrón AL Vázquez de Parga JM Gallego JJ de Miguel R Miranda |
| Institution: | (1) Departamento de Física de la Materia Condensada and Instituto de Ciencia de Materiales “Nicolás Cabrera”, Universidad Autónoma de Madrid, Cantoblanco, 28049-Madrid, Spain, ES;(2) European Synchrotron Radiation Facility, E.S.R.F., BP 220, F-38043 Grenoble Cedex, France, FR;(3) Instituto de Física Rosario, 2000-Rosario, Argentina, AR;(4) INTEC-CONICET, Universidad Nacional del Litoral, 3000-Santa Fe, Argentina, AR;(5) Instituto de Ciencia de Materiales, (CSIC), Cantoblanco, 28049-Madrid, Spain, ES |
| Abstract: | Interlayer diffusion in epitaxial systems with a high energy barrier at the atomic steps – the so-called Ehrlich–Schwoebel (ES) barrier – is strongly reduced. As a consequence of this, a continuous accumulation of roughness takes place during growth. This undesirable effect can be corrected by using surfactant agents. We have studied the influence of the ES barrier on the preparation of epitaxial films on Cu(111), and the surfactant effect of a monolayer of Pb. Received: 21 April 1999 / Accepted: 17 August 1999 / Published online: 6 October 1999 |
| Keywords: | PACS: 68 35 Fx 68 55 -a 81 10 -h |
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