| 纳米压痕和划痕法测定氧化硅薄膜材料的力学特性 |
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| 引用本文： | 张海霞,张泰华,郇勇. 纳米压痕和划痕法测定氧化硅薄膜材料的力学特性[J]. 微纳电子技术, 2003, 0(Z1) |
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| 作者姓名： | 张海霞 张泰华 郇勇 |
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| 作者单位： | 北京大学微电子研究院 北京100871(张海霞)，中国科学院力学研究所非线性力学国家重点实验室 北京100080(张泰华)，中国科学院力学研究所非线性力学国家重点实验室 北京100080(郇勇) |
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| 摘 要： | 为了研究不同制备工艺对材料力学性能的影响 ,选择了热氧化、LPCVD和PECVD三种典型工艺 ,在硅片上制备 1μm氧化硅薄膜。通过纳米压痕和划痕检测可知 ,热氧化工艺制备的SiO2薄膜的硬度和模量最大 ,LPCVD制备的样品界面结合强度高于PECVD。纳米压痕和划痕技术为此提供了丰富的近表面弹塑性变形和断裂等的信息 ,是评价微米薄膜力学性能的有效手段
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| 关 键 词： | 纳米压痕 纳米划痕 力学特性 氧化硅 热氧化 LPCVD PECVD |
Nanoindentation and nanoscratch measurements on the mechanical properties of SiO_2 film |
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| ZHANG Hai xia ,ZHANG Tai Hua ,HUAN Yong. Nanoindentation and nanoscratch measurements on the mechanical properties of SiO_2 film[J]. Micronanoelectronic Technology, 2003, 0(Z1) |
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| Authors: | ZHANG Hai xia ZHANG Tai Hua HUAN Yong |
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| Affiliation: | ZHANG Hai xia 1,ZHANG Tai Hua 2,HUAN Yong 2 |
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| Abstract: | Studies of the nanoindentation and nanoscratch were performed on the SiO 2 coatings with the thickness of 1.0μm on Si (100) fabricated respectively by LPCVD, PECVD and thermal oxide to evaluate the effect of the fabrication processes on their mechanical properties. The data showed that the hardness and modulus of the SiO 2 coating fabricated by the thermal oxide were highest, and the interfacial adhesive strength between SiO 2 and Si fabricated by LPCVD was higher than PECVD. Nanoindentation and nanoscratch tests can provide more information about the near surface elastic plastic deformation and fracture properties. |
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| Keywords: | nanoindentation nanoscratch mechanical properties SiO 2 thermal oxide LPCVD PECVD |
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