首页 | 本学科首页   官方微博 | 高级检索  
     检索      

丙烯酰胺/甲基丙烯酰氧乙基二甲基丙磺酸铵共聚物的合成及其性能
引用本文:关慧敏,张巍巍,于廷云.丙烯酰胺/甲基丙烯酰氧乙基二甲基丙磺酸铵共聚物的合成及其性能[J].合成化学,2017,25(2):163-165.
作者姓名:关慧敏  张巍巍  于廷云
作者单位:辽宁石油化工大学 化学化工与环境学部,辽宁 抚顺 113001
摘    要:以二甲氨基乙醇和丙烯酰氯为原料,制得丙烯酸二甲胺乙酯(DMAEA); DMAEA与1,3-丙磺内酯反应制得甜菜碱型乙烯基两性离子单体--甲基丙烯酰氧乙基二甲基丙磺酸铵(MSBM); MSBM与50%丙烯酰胺水溶液共聚合成了两性聚合物丙烯酰胺/甲基丙烯酰氧乙基二甲基丙磺酸铵(AM/MSBM),其结构经1H NMR和IR确证。研究了矿化度,剪切作用和温度对AM/MSBM粘度的影响。结果表明:AM/MSBM具有反聚电解质溶液行为。在实验条件(盐水矿化度1 075.9 mg·L-1,温度45~75 ℃,剪切速率2 000 rpm)下,AM/MSBM的粘度保持率>90%。模拟驱油实验结果表明,AM/MSBM可提高采收率13.2%。

关 键 词:甲基丙烯酰氧乙基二甲基丙磺酸铵  丙烯酰胺  两性聚合物  合成  
收稿时间:2016-06-29

Synthesis and Properties of Acrylamide/Methyl Acryloyl Oxygen Ethyl Dimethyl Ammonium Propyl Sulfonic Acid Copolymer
GUAN Hui-min,ZHAGN Wei-wei,YU Ting-yun.Synthesis and Properties of Acrylamide/Methyl Acryloyl Oxygen Ethyl Dimethyl Ammonium Propyl Sulfonic Acid Copolymer[J].Chinese Journal of Synthetic Chemistry,2017,25(2):163-165.
Authors:GUAN Hui-min  ZHAGN Wei-wei  YU Ting-yun
Abstract:Ethyl acrylate dimethylamine( DMAEA) was obtained using dimethylaminoethanol and acry-loyl chloride as the raw materials. Then a betaine type vinyl zwitterionic monomer, methyl acryloyl ox-ygen ethyl dimethyl ammonium propyl sulfonic acid( MSBM) , was prepared by the reaction of DMAEA with 1,3-propyl sulfonic lactone. Copolymer AM/MSBM was synthesized by copolymerization of 50%acrylamide solution with MSBM. The structure was confirmed by 1 H NMR and IR. Effects of the exam-ines salinity, shear effect and temperature on the viscosity of AM/MSBM were investigated. The results indicated that AM/MSBM exhibited anti-polyelectrolyte solution behavior. Under the experiment condi-tions(salinity of 1075. 9 mg·L-1, 45~75℃, shear rate of 2000 rpm), the viscosity of AM/MSBM remains above 90%. The imitation oil recovery experiment results showed that AM/MSBM can promote recovery rate with 13 . 2%.
Keywords:MSBM  acrylamide  zwitterionic polymer  synthesis
本文献已被 CNKI 万方数据 等数据库收录!
点击此处可从《合成化学》浏览原始摘要信息
点击此处可从《合成化学》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号