Atomic layer epitaxy of AlP and (AlP)n(GaP)n superlattice using ethyldimethylamine alane as a new aluminum source

Atomic layer epitaxy (ALE) of AlP was realized using ethyldimethylamine alane (EDMAAl) as a new Al source. Self-limiting growth of AlP took place at one and two monolayers per ALE cycle. Secondary ion mass spectroscopy revealed that the amounts of incorporated impurities (carbon, hydrogen and oxygen) in ALE-grown AlP layers was greatly suppressed by using the new Al source, to nearly the same levels as in high-quality MOVPE-grown layers. We also achieved the successful ALE growth of (AlP)_n(GaP)_n short-period superlattices (SLs), taking advantage of the overlapping temperature windows of ALE-GaP and ALE-AlP. X-ray diffraction measurements showed reasonably good interface abruptness of SLs as low as 3. The PL emission peak from SLs involving Al-containing layers was observed in ALE growth for the first time.