电驱动金刚石对顶砧低温连续加压装置

采用电驱动压电陶瓷取代传统机械螺丝给金刚石对顶砧施加压力,设计制备了低温下可连续增加流体静压的金刚石对顶砧压力装置,实现了低温(19±1)K连续加压达到4.41 GPa.该装置具有电驱动方便灵活、调谐精度高的低温连续加压功能.利用该装置实现了InAs单量子点发光与微腔腔模的共振耦合调谐过程.该装置将在原位压力精确调谐及测量样品信号跟踪等实验得到应用.

In situ tuning hydrostatic pressure at low temperature using electrically driven diamond anvil cell

Traditionally, a diamond anvil cell (DAC) operated at low temperature can be pressurized by using a helium-driven piston or remote control tightening mechanism. This approach of pressurizing DAC is not convenient for operating at low temperature. Here we develop a low-temperature pressurizing technique for in situ tuning pressure in DAC at 20 K by an electrically driven method. The improved DAC pressure apparatus is composed of traditional DAC device and a piezoelectric actuator (PZT). Here the PZT used in the experiment is the PSt 150/10×10/40 supplied by the Piezomechanik. Both parts are assembled together in a red copper or stainless steel cylinder. The DAC part is thermally contacted with a low temperature holder for cooling the chamber of the DAC in the experiment. The wires of the PZT connect with the voltage source through the wiring terminals of the cryostat. As the DAC apparatus cools down, two electrodes of the PZT are connected together when a voltage difference between the electrodes is generated. When the temperature of the DAC chamber arrives at the presetting value, two electrodes of the PZT are connected with the voltage source for applying voltage to the PZT. In this paper, we find that the PZT stroke shows a linear increase with increasing voltage at 300 K, whereas it is approximately linear at 80 and 6 K. The maximum strokes are 40, 26 and 15 μupm at 300, 80 and 6 K respectively when the applied voltage is 120 V. The experimental results show that the PZT-driven DAC apparatus can continuously generate pressure from 0.49 to 4.41 GPa at low temperature and applied voltage of 0-290 V, where at zero voltage an initial pressure of 0.49 GPa is generated by using driven screws of the DAC device at room temperature. The pressure in the DAC chamber is determined by the red shift of ruby florescence line. The calibrated chamber temperature in DAC is determined as a function of pressure (PZT voltage) by using the intensity ration (R₂/R₁) of ruby R₂ and R₁ fluorescence lines. We find that the chamber temperature only slightly increases with increasing pressure in a range of (19± 1) K. The main difference between the present device and the other tuning DAC apparatus is that the force on the DAC can be conveniently applied by using PZT voltage. This guarantees a high pressure-tuned resolution in the experiment, e. g., we tune a single InAs quantum dot (QD) emission wavelength to match the cavity mode. Such a tuning technique is found to have applications in realizing a compact tunable single photon source or completing two-photon interference of Hong-Ou-Mandel experiments between the QD and nitrogen vacancy center in diamond or atom, respectively.