不同退火温度的Al_2O_3:C薄膜热释光和光释光性能

α-Al_2O_3:C晶体的热释光和光释光性能优越,但其制备要求高,需高温和高还原气氛.与α-Al_2O_3:C晶体性能接近的α-Al_2O_3:C陶瓷,热释光峰不单一.本文采用两次阳极氧化法在0.5 mol/L的草酸溶液中5℃恒温制备高度均匀有序的多孔Al_2O_3:C薄膜,主要研究不同退火温度对其热释光和光释光特性的影响.结果表明,经不同温度退火后的Al_2O_3:C薄膜均为非晶结构;不同退火温度的Al_2O_3:C薄膜热释光的主发光峰约在310℃左右,符合通用级动力学模型.600℃退火后的Al_2O_3:C薄膜热释光灵敏度最强,其热释光剂量曲线在1-10 Gy范围内具有很好的线性响应,在剂量10-120 Gy范围内出现超线性响应;在相同的辐照剂量下,随着退火温度的升高(≤600℃)光释光的初始发光强度逐渐增强.不同退火温度的Al_2O_3:C薄膜光释光衰减曲线都呈典型的指数衰减且快衰减速率相比α-Al_2O_3:C晶体显著加快.600℃退火后的Al_2O_3:C薄膜光释光灵敏度最强,其光释光剂量响应曲线在1-200 Gy整体上都具有很好的剂量线性关系.与热释光相比,Al_2O_3:C薄膜的光释光具有更宽的线性剂量响应范围.此研究为Al_2O_3:C薄膜作为光释光辐射剂量材料做出了有益的探索.

Thermoluminescence and optically stimulated luminescence characteristics of Al2O3:C films annealed at different tempeartures

α-Al₂O₃:C crystal is a high sensitive luminescence dosemeter, and it possesses a high thermoluminescence (TL) sensitivity, approximately 40-60 times greater than LiF: Mg, Ti. However, the crystal growth requires sophisticated laboratories, high temperatures and highly reducing atmosphere. The fluorescence and TL characteristics of α -Al₂O₃:C ceramic are similar to those of α -Al₂O₃:C crystal, however, it shows three TL peaks. In this work, porous alumina membranes are prepared by two-step anodization in 0.5 M/L oxalic acid at 5 ℃. We investigate the influence of annealing temperature (≤ 600 ℃) on thermoluminescence (TL) and optically stimulated luminescence (OSL) characteristics of Al₂O₃:C films and discuss the influence mechanism. The scanning electron microscopy measurement reveals that Al₂O₃:C film possesses highly ordered nanopores with homogeneous dimensions arranged in a closed-packed hexagonal pattern. The energy dispersive X ray spectroscopy and the Fourier transform infrared spectroscopy results indicate that oxalic acid impurity is incorporated into the porous alumina membrane in the synthesis process, after the annealing treatment, the oxalic acid impurity decomposes and C²⁺ replaces Al³⁺, which leads to the formation of F⁺and the C content of samples increasing with elevated annealing temperature. The X-ray diffraction measurement reveals that Al₂O₃:C films annealed at different temperatures are amorphous. TL measurements show that the dominated peak of Al₂O₃:C film is centered at around 310 ℃, owing to the number of F⁺increasing with the annealed temperature increasing, under the same irradiation dose, the sample annealed at 600 ℃ has the greatest TL intensity. With the increase of the irradiation dose, the TL intensity increases and the dominated peak gradually shifts to high temperature, which is consistent with the general order kinetic model. The sample annealed at 600 ℃ has the greatest TL sensitivity and its TL response shows excellent linear characteristic in as dose range of 1-10 Gy, but shows super-linear behavior in a dose range of 10-120 Gy. The OSL measurements show that with the increases of the annealed temperature and the irradiation dose, the OSL initial intensity increases and each of all samples shows a typical exponential decay. Compared with the case of α -Al₂O₃:C crystal, the fast attenuation rate of film is dramatically accelerated. In a dose range of 1-200 Gy, the OSL responses of all samples each show an excellent linear characteristic, the sample annealed at 600 ℃ has the greatest OSL sensitivity. Compared with TL response, OSL response of Al₂O₃:C film shows a wider range of linear dose response. In this paper we have made a beneficial exploration for Al₂O₃:C films as OSL dosimerer.