| 直流溅射法制备电致变色WO_3膜 |
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| 引用本文： | 丘思畴,黄汉尧,舒兴胜,徐彦忠.直流溅射法制备电致变色WO_3膜[J].发光学报,1994(2). |
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| 作者姓名： | 丘思畴 黄汉尧 舒兴胜 徐彦忠 |
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| 作者单位： | 华中理工大学固体电子学系 |
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| 摘 要： | 采用ＷＯ３陶瓷靶直流溅射制作了电致变色膜．介绍了制膜工艺．分析测试表明，膜有无定形结构；除有正常成分ＷＯ３外，还含有来自衬底及反应室内的微量杂质．电致变色谱响应特性和电化学特性的测量证明，膜的电色活性良好．还对实验结果作了理论分析．
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| 关 键 词： | 电致变色，直流溅射，WO_3 |
DC SPUTTERED-DEPOSITED ELECTROCHROMIC WO_3 THIN FILM |
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| Qiu Sichou,Huang Hanyao,Shu Xingsheng,Xu Yanzhong.DC SPUTTERED-DEPOSITED ELECTROCHROMIC WO_3 THIN FILM[J].Chinese Journal of Luminescence,1994(2). |
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| Authors: | Qiu Sichou Huang Hanyao Shu Xingsheng Xu Yanzhong |
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| Abstract: | Thin films of tungsten oxide were prepared by D. C. sputtering of WO3 ceramic target in Ar gas,the process is presented. SCE and XPS were employed to inverstigate the microstructure of the films and identify its chemical composition. The electrical and optical properties of the films were determined by cyclic voltammetry, spectral transmittance, current-time relationship and response time measurements. Our results indicate that the a-WO3 thin films have good electrochromic characteristics. |
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| Keywords: | electrochromic D C sputtering WO_3 |
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