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激光显微拉曼技术检测晶体管工作电流导致的器件自加热现象
引用本文:徐剑芳,赖虹凯,李成.激光显微拉曼技术检测晶体管工作电流导致的器件自加热现象[J].光散射学报,2012,24(1):64-68.
作者姓名:徐剑芳  赖虹凯  李成
作者单位:厦门大学物理与机电工程学院物理学系,厦门,361005
基金项目:国家自然科学基金(61036003,60837001)
摘    要:随着晶体管尺寸的日益缩小,不良热效应成为晶体管失效重要原因之一.现有的检测器件热分布的手段的空间分辨率较低,不能原位直观地获得这些尺寸越来越小的晶体管的工作过程中的热分布情况.本文针对以上问题,在变温系统上探索利用激光显微拉曼光谱技术原位检测晶体管的自热效应,结果表明可以通过器件衬底上硅的一阶声子振动的拉曼谱峰频率随温...

关 键 词:激光显微拉曼  热效应  晶体管    频率位移
收稿时间:2011/11/15

Laser Raman Microscopy for Measuring the Self-heating Effect in Transistors
XU Jian-Fang , LAI Hong-Kai , LI Cheng.Laser Raman Microscopy for Measuring the Self-heating Effect in Transistors[J].Chinese Journal of Light Scattering,2012,24(1):64-68.
Authors:XU Jian-Fang  LAI Hong-Kai  LI Cheng
Institution:(Department of Physics,School of Physics and Mechanical and Electrical Engineering,Xiamen University,Xiamen 361005,China)
Abstract:With the decrease of the chip size of transistors,notorious heating effect becomes one of the most important factors accounting for the failure of transistors.The existing methods for measuring the heat distribution of devices suffer from the low spatial resolution and cannot intuitively obtain the heat distribution during the working of the transistors with decreasing dimensions.Aiming to solve the problem,the present work employed laser Raman microscopy to in situ measure the self-heating effect of transistors with a temperature controlled device.The result reveals that it is feasible to determine the temperature of the device by analyzing the shift of Raman frequency of single phonon vibration of the silicon substrate with the temperature.The temperature of a β-FeSi2/Si bipolar junction was measured by this method.The result convincingly demonstrates that Raman microscopy can be an effective way to detect the temperature change of the device.
Keywords:laser Raman microscopy  heating effect  transistor  silicon  frequency shift
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