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Coulomb drag in topological insulator films
Affiliation:1. ICQD, Hefei National Laboratory for Physical Sciences at the Microscale, University of Science and Technology of China, Hefei 230026, Anhui, China;2. School of Physics, The University of New South Wales, Sydney 2052, Australia;1. State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 610054, China;2. Key Laboratory of Information Materials of Sichuan Province & School of Electrical and Information Engineering, Southwest University for Nationalities, Chengdu 610041, China
Abstract:
Keywords:Electron–electron interactions  Coulomb drag  Topological insulator
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