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Pt coated Cr2O3 thin films for resistive gas sensors
Authors:Aarne Kasikov  Alar Gerst  Arvo Kikas  Leonard Matisen  Agu Saar  Aivar Tarre  Arnold Rosental
Affiliation:(1) Institute of Physics, University of Tartu, Riia 142, 51014 Tartu, Estonia;(2) Estonian Nanotechnology Competence Center, Riia 142, 51014 Tartu, Estonia
Abstract:The resistive response of atomic layer deposited thin epitaxial α-Cr2O3(0 0 1) films, to H2 and CO in air, was studied. The films were covered with Pt nanoislands formed by electron-beam evaporation of a sub-monolayer amount of the material. The gas measurements were performed at 250°C and 450°C. These temperatures led to different proportion of chemical states, Pt2+ and Pt4+, to which the Pt oxidized. The modification was ascertained by the X-ray photoelectron spectroscopy method. As a result of the modification, the response was fast at 250°C, but slowed at 450°C. A disadvantageous abundance of Pt4+ arising at 450°C in air could be diminished by high-vacuum annealing thus restoring the response properties of the system at 250°C.
Keywords:semiconductor gas sensors  epitaxial chromia  platinum nanoislands  atomic layer deposition (ALD)  X-ray photoelectron spectroscopy (XPS)
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