Profile of an unsuccessful process and the criteria for a successful process for the chemical vapor infiltration process |
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| Authors: | Andrew D. Jones Jr. |
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| Affiliation: | Department of Mathematics, Florida A&M University, Tallahassee, FL 32307, USA |
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| Abstract: | A model for chemical vapor infiltration is analyzed. Consider a cylindrical pore with a reacting and carrier gas flowing in from the left. The gas reacts with the interior of the pore and the result is a solid matrix. The model assumes that the flux due to binary diffusion is negligible. The model also assumes that the reactions are first order. |
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