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Development of Na+-sensitive membranes based on sputtered Na-Al-Si glasses
Authors:Michael Bruns  Roland Schlesinger  Hanns Klewe-Nebenius  Horst Baumann  Ronald Becht  Hans J Ache
Institution:(1) Institut für Radiochemie, Forschungszentrum Karlsruhe GmbH, P.O.B. 3640, D-76021 Karlsruhe, Federal Republic of Germany;(2) Institut für Kernphysik, Universität Frankfurt/Main, Aug.-Euler-Strasse 6, D-60486 Frankfurt, Federal Republic of Germany
Abstract:Na+-sensitive microdevices are of increasing interest for integration in microanalytical systems e.g. for biomedical applications or for industrial process control. In order to produce ultra thin Na+-sensitive layers with fixed and reproducible composition and, in particular, defined Na concentration by means of RF sputtering, an off-axis geometry of a magnetron with cylindrical target was chosen for minimizing back-sputtering effects from the already deposited material. With this inverted cylindrical magnetron (ICM) it was possible to obtain reproducible and controllable sodium aluminosilicate glass layers on semiconductor substrates. Several surface and thin layer analytical techniques were applied for characterization of the membranes and for stoichiometry control. Especially by the non-destructive nuclear reaction analysis method a constant Na profile throughout the glass layer and — together with AES depth profiles — the diffusion barrier effect of an Si3N4 interface layer could be verified. Electrochemical measurements proved Nernstian sensitivity down to 10–4 M Na+ in solutions of pH 7, supporting sufficient stability and reproducibility of the sputtered Na+-sensitive layers.
Keywords:Na-sensitive glass membranes  RF magnetron sputtering  surface analysis  depth profiles  capacitance
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